PURPOSE: To provide a high-resolution and high sensitivity sensor in which electrodes are laid along a wall part of a third chamber, and the other one of pairs of electrodes is arranged on the surface of a common substrate constituting a base of the sensor.
CONSTITUTION: A sensor is composed of an upper plate 2 forming first and second chambers 4, 6, movable membranes 8, 10 relating respectively to the first second and second chambers 4, 6, and a spacer 14 for forming a third chamber 16. The surface 40 of the plate 14 serving as a common electrode for capacitors C1, C2, and the membranes 8, 10 serve as the other electrodes thereof, the spacer 14 defining the gap therebetween. Thus, the sensitivity of the sensor using a capacitive difference between the capacitors C1, C2 is dependent upon the thickness of the spacer 2 and the membranes 8, 10. Through the micro-processing technology for a semiconductor, the thickness can be easily controlled, thereby it is possible to provide a high resolution and high sensitivity sensor.
FUIRITSUPU RENAADO
JPS61500633A | 1986-04-03 |