Title:
Carbon dioxide reduction method and reduction device
Document Type and Number:
Japanese Patent JP6343258
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To make it possible, in reduction of carbon dioxide, to selectively generate a gas containing methane as a main product or a gas containing carbon monoxide as a main product.SOLUTION: Provided is a semiconductor thin film comprising a substrate, a semiconductor thin film which is formed on the substrate and exhibits a catalytic function by light irradiation, and metallic fine particles adhering on the semiconductor thin film. When light is radiated on the semiconductor thin film or the metallic fine particles in an aqueous solution in which carbon dioxide is dissolved, carbon dioxide, which is in contact with the semiconductor thin film or the metallic fine particles, is reduced.SELECTED DRAWING: Figure 1
Inventors:
Yoko Ono
Takeshi Komatsu
Jiro Nakamura
Takeshi Komatsu
Jiro Nakamura
Application Number:
JP2015115214A
Publication Date:
June 13, 2018
Filing Date:
June 05, 2015
Export Citation:
Assignee:
Nippon Telegraph and Telephone Corporation
International Classes:
C01B32/40; B01J23/50; B01J23/72; B01J23/755; B01J35/02; C07C1/02; C07C9/04
Domestic Patent References:
| JP2005186005A | ||||
| JP7033697A | ||||
| JP2013043123A | ||||
| JP2013034915A |
Foreign References:
| WO2012137240A1 | ||||
| WO2010001437A1 | ||||
| WO2014169258A1 |
Attorney, Agent or Firm:
Patent Business Corporation Tani/Abe Patent Office
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