Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2020176113
Kind Code:
A
Abstract:
To provide a salt capable of producing a resist pattern having good line edge roughness (LER), an acid generator, and a resist composition containing the same.SOLUTION: A carboxylate represented by Formula (I), a carboxylic acid generator, and a resist composition are provided. [R1 and R2 each independently represent H, F or an alkyl group having F. R3 represents F or an alkyl group having F. R4 and R5 each independently represent a halogen atom, a fluorinated alkyl group or an alkyl group, and -CH2- contained in the fluorinated alkyl group and the alkyl group may be substituted with -O- or -CO-. m4 represents an integer of 0-4, m5 represents an integer of 0-5. X0 represents an optionally substituted hydrocarbon group or the like.]SELECTED DRAWING: None
Inventors:
MASUYAMA TATSURO
NAGATA SHUNJIRO
ICHIKAWA KOJI
NAGATA SHUNJIRO
ICHIKAWA KOJI
Application Number:
JP2020071592A
Publication Date:
October 29, 2020
Filing Date:
April 13, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C62/24; C07C69/63; C07D321/10; C08F212/14; C08F220/18; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation