Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2020176114
Kind Code:
A
Abstract:
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern with a good mask error factor (MEF).SOLUTION: A carboxylate represented by Formula (I), a carboxylic acid generator, and a resist composition are provided. [In the formula, R1a and R2a each represent H, a hydrocarbon group which may have F, or the like; R3a represents H, or R1a, R2a and R3a are bonded together to form a ring which may have F or an alkyl group; R4 and R5 each independently represent a halogen atom, a fluorinated alkyl group or the like; m4 represents an integer of 0-4; m5 represents an integer of 0-5; and X0 represents an optionally substituted hydrocarbon group.]SELECTED DRAWING: None
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Inventors:
MASUYAMA TATSURO
NAGATA SHUNJIRO
ICHIKAWA KOJI
NAGATA SHUNJIRO
ICHIKAWA KOJI
Application Number:
JP2020071681A
Publication Date:
October 29, 2020
Filing Date:
April 13, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C62/24; C07C69/63; C07D321/10; C08F220/18; C08F220/28; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation