Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2020176117
Kind Code:
A
Abstract:
To provide a salt capable of producing a resist pattern having a good mask error factor (MEF), an acid generator, and a resist composition containing the same.SOLUTION: A carboxylate represented by Formula (I), an acid generator, and a resist composition are provided. [In the formula, R1a and R1b each represent a hydrogen atom or an acid-labile group; R2 and R3 each represent a halogen atom, a fluorinated alkyl group, an alkyl group or the like, and -CH2- contained in the fluorinated alkyl group and the alkyl group may be substituted with -O- or -CO-; m2 represents an integer of 0-4; m3 represents an integer of 0-5; and X0 represents an optionally substituted hydrocarbon group, and -CH2- contained in the group may be substituted with -O-, -S-, -CO- or -SO2-.]SELECTED DRAWING: None
Inventors:
MASUYAMA TATSURO
NAGATA SHUNJIRO
ICHIKAWA KOJI
NAGATA SHUNJIRO
ICHIKAWA KOJI
Application Number:
JP2020072417A
Publication Date:
October 29, 2020
Filing Date:
April 14, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C69/76; C07C62/24; C07D321/10; C08F22/18; C08F220/10; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation