Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2020176118
Kind Code:
A
Abstract:
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator, and a resist composition containing the same.SOLUTION: A carboxylate represented by Formula (I), a carboxylic acid generator, and a resist composition are provided. [In the formula, R1 and R2 each represent H, F or an alkyl group having F; R3 represents F or an alkyl group having F; R4 and R5 each independently represent a halogen atom, a fluorinated alkyl group or the like, and -CH2- contained in the fluorinated alkyl group or the like may be substituted with -O- or -CO-; m4 represents an integer of 0-4; m5 represents an integer of 0-5; and X0 represents a hydrocarbon group, and -CH2- contained in the hydrocarbon group may be substituted with -O-, -S- or the like.]SELECTED DRAWING: None
Inventors:
MASUYAMA TATSURO
NAGATA SHUNJIRO
ICHIKAWA KOJI
NAGATA SHUNJIRO
ICHIKAWA KOJI
Application Number:
JP2020072418A
Publication Date:
October 29, 2020
Filing Date:
April 14, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C69/76; C07C62/24; C07D321/10; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation
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