Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2020180115
Kind Code:
A
Abstract:
To provide a salt, an acid generator, and a resist composition capable of producing a resist pattern with good CD uniformity (CDU).SOLUTION: A salt of formula (I) and a resist composition containing the same are provided. [In the formula, R1a and R2a each represent H or an alkyl group; m0 represents an integer of 1-5; R3 and R4 each represent a halogen atom, a fluorinated alkyl group or the like; m3 represents an integer of 0-4 and m4 represents an integer of 0-5; and X0 represents an optionally substituted hydrocarbon group, provided that -CH2- in the group may be substituted with -O-, -S-, -CO- or the like.]SELECTED DRAWING: None
Inventors:
MASUYAMA TATSURO
KATSURA NATSUKI
ICHIKAWA KOJI
KATSURA NATSUKI
ICHIKAWA KOJI
Application Number:
JP2020073386A
Publication Date:
November 05, 2020
Filing Date:
April 16, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C62/24; C07C43/225; C07D317/30; C07D317/72; C07D319/06; C07D319/08; C07D321/10; C07D339/06; C07D339/08; C07D407/12; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation