Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2021008455
Kind Code:
A
Abstract:
To provide a carboxylate capable of producing a resist pattern having good line edge roughness (LER), a carboxylic acid generator, and a resist composition containing the same.SOLUTION: The carboxylate represented by formula (I), the carboxylic acid generator, and the resist composition are provided. [R1a represents H or an acid-labile group; R2 represents a halogen atom, a substituted/unsubstituted fluorinated alkyl group or a substituted/unsubstituted alkyl group; R3 represents a halogen atom, a substituted/unsubstituted fluorinated alkyl group, a substituted/unsubstituted alkyl group or -L11'-CO-O-R1b; R1b represents H or an acid-labile group; L11 and L11' each represent a substituted/unsubstituted alkanediyl group; m2 represents an integer of 0-4; m3 represents an integer of 0-5; and X0 represents a substituted/unsubstituted hydrocarbon group.]SELECTED DRAWING: None
Inventors:
MASUYAMA TATSURO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2020112009A
Publication Date:
January 28, 2021
Filing Date:
June 29, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C57/58; C07C62/24; C07C69/65; C07D321/10; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation