Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2021008465
Kind Code:
A
Abstract:
To provide a carboxylate capable of producing a resist pattern having good pattern collapse resistance.SOLUTION: The carboxylate is represented by formula (I) [where R1a and R2a each represent H or a hydrocarbon group optionally having F or are bonded together to form a ring optionally having F or an alkyl group; R3a represents H, or R1a, R2a and R3a are bonded together to form a ring optionally having F or an alkyl group; R4 and R5 each represent a halogen atom, a fluorinated alkyl group, an alkyl group or the like; L11 represents an alkanediyl group; m4 represents an integer of 0-4; m5 represents an integer of 0-5; and X0 represents an optionally substituted hydrocarbon group].SELECTED DRAWING: None
Inventors:
MASUYAMA TATSURO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2020112063A
Publication Date:
January 28, 2021
Filing Date:
June 29, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C69/65; C07C62/24; C07D321/10; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation