Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2021178815
Kind Code:
A
Abstract:
To provide a salt and an acid generator which make it possible to produce a resist pattern with excellent pattern collapse margin (PCM) and a resist composition comprising the same.SOLUTION: The present invention discloses a carboxylate represented by, for example, the formula (I-2), a carboxylic acid generator and a resist composition.SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
NISHITANI NOBUHIKO
ICHIKAWA KOJI
NISHITANI NOBUHIKO
ICHIKAWA KOJI
Application Number:
JP2021055317A
Publication Date:
November 18, 2021
Filing Date:
March 29, 2021
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D305/06; C07D303/16; C07D321/10; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation