Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2021193075
Kind Code:
A
Abstract:
To provide a carboxylate capable of producing a resist pattern having good line edge roughness (LER), a carboxylic acid generator and a resist composition.SOLUTION: There are provided a carboxylate represented by the formula (I), a carboxylic acid generator and a resist composition. [In the formula, R1 and R2 each represent -O-L1-CO-O-R10; L1 represents an alkanediyl group; R4, R5, R7 and R8 each represent a halogen atom, an alkyl fluoride group or the like; R10 represents a group represented by the formula (IC); RA represents a saturated hydrocarbon group; u1 represents an integer of 0 to 2; s1 represents 1 or 2, t1 represents 0 or 1, provided that s1+t1=1 or 2; L2 represents a hydrocarbon group; X1 and X2 each represent S or O; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represent an integer of 0 to 4, provided that 1≤m1+m7≤5 and 0≤m2+m8≤5; X0 represents a hydrocarbon group.]SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
NAKAKOJI TAKASHI
ICHIKAWA KOJI
NAKAKOJI TAKASHI
ICHIKAWA KOJI
Application Number:
JP2021086200A
Publication Date:
December 23, 2021
Filing Date:
May 21, 2021
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D305/06; C08F220/18; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation
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