Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2022191200
Kind Code:
A
Abstract:
To provide a carboxylate which allows a resist pattern having a good mask error factor (MEF) to be produced, and a resist composition containing the same.SOLUTION: There are provided a carboxylate represented by formula (I), a carboxylic acid generator, and a resist composition. [In the formula, R1-R3 each represent a specific substituent; R4-R9 each represent a halogen atom or the like; A1-A3 each represent a hydrocarbon group, provided that the group may have a substituent; m1-m9 each represent a specific integer; X4 represents a single bond or the like; and X0 represents a hydrocarbon group.]SELECTED DRAWING: None
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Inventors:
KOMURO KATSUHIRO
IKEDA HIDEAKI
ICHIKAWA KOJI
IKEDA HIDEAKI
ICHIKAWA KOJI
Application Number:
JP2022095947A
Publication Date:
December 27, 2022
Filing Date:
June 14, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D321/10; C07C62/14; C07C62/24; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation
Previous Patent: JPWO2022191199
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