Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023008907
Kind Code:
A
Abstract:
To provide a carboxylate which allows a resist pattern having good line edge roughness (LER) to be produced, and a resist composition containing the same.SOLUTION: Specifically, there are provided a carboxylate represented by, e.g., formula (I-1) and a resist composition.SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
TERAHIGASHI SHOHEI
ICHIKAWA KOJI
TERAHIGASHI SHOHEI
ICHIKAWA KOJI
Application Number:
JP2022104082A
Publication Date:
January 19, 2023
Filing Date:
June 28, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D307/00; C07D313/10; C08F20/10; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation