CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Title:

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2023008964

Kind Code:

A

Abstract:

To provide a carboxylate and a resist composition which allow a resist pattern having good line edge roughness (LER) to be produced.SOLUTION: Specifically, there are provided: a carboxylate represented by, e.g., formula (I-1) and the like; and a resist composition.SELECTED DRAWING: None

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Inventors:

KOMURO KATSUHIRO
TAKAHASHI YUKI
ICHIKAWA KOJI

Application Number:

JP2022106228A

Publication Date:

January 19, 2023

Filing Date:

June 30, 2022

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

C07D409/12; C07C62/06; C07C62/24; C07D321/10; C07D333/76; C09K3/00; G03F7/004

Attorney, Agent or Firm:

Shinki Global IP Patent Corporation

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