CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Title:

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2023184474

Kind Code:

A

Abstract:

To provide a carboxylate, a resist composition, and the like which allow a resist pattern having good line edge roughness to be produced.SOLUTION: There are provided a carboxylate of a triphenylsulfonium cation of a specific structure having a cyclic ether group, a carboxylic acid generator, and a resist composition.SELECTED DRAWING: None

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Inventors:

NAKAMURA HIROMU
DOI DAIGO
ICHIKAWA KOJI

Application Number:

JP2023097289A

Publication Date:

December 28, 2023

Filing Date:

June 13, 2023

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

G03F7/004; C07D303/16; C07D305/06; C07D321/10; C09K3/00; G03F7/038; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Patent Attorney Corporation Shinju Global IP

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