Title:
CARBOXYLATE, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2021001162
Kind Code:
A
Abstract:
To provide: a carboxylate capable of producing a resist pattern with good CD uniformity (CDU); and a resist composition containing the same.SOLUTION: Provided are a carboxylate represented by formula (I) and a resist composition containing the same. (In the formula, W represents a C3-18 alicyclic hydrocarbon ring; X1 represents *-CO-O-, *-O-CO-, *-O-CO-O-, or *-O-; L1 represents a single bond or an alkanediyl group; R1 represents an alkyl group or an alicyclic hydrocarbon group which may have a substituent; R2 represents a fluorine atom, a C1-6 fluorinated alkyl group, a nitro group, a cyano group, or a C1-12 alkyl group; m2 represents any integer of 0-6; and Z1+ represents an organic cation.]SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2020100813A
Publication Date:
January 07, 2021
Filing Date:
June 10, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C69/75; C07C381/12; C07D321/10; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation