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Title:
CATALYTIC OR PHOTOCATALYTIC PREPARATION METHOD OF PARYLENE AF4
Document Type and Number:
Japanese Patent JP2014019700
Kind Code:
A
Abstract:

To provide a parylene AF4 (octafluoro-[2,2]-paracyclophane) preparation method characterized by a high reactant concentration, short reaction time, low cost, less by-products, easy purification, good reproducibility and a stable yield.

The preparation method includes preparing a reactant and a reducing agent and using a catalyst or exposure to UV light with a photoinitiator, to minimize by-product formation and thereby to shorten the reaction time. The high-concentration reaction mixture results in a high-purity (greater than 99%) parylene AF4 product.


Inventors:
LIN CHUN-HSU
CHIEN-YI SUN
YUNG-YU YIN
CHUN-SHIH LI
YO-CHUN CHOU
Application Number:
JP2012236320A
Publication Date:
February 03, 2014
Filing Date:
October 26, 2012
Export Citation:
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Assignee:
YUAN SHIN MATERIALS TECHNOLOGY CORP
International Classes:
C07C17/269; B01J27/055; B01J27/08; B01J27/138; C07C23/18; C07B61/00
Domestic Patent References:
JP2001515507A2001-09-18
JPH11513689A1999-11-24
Foreign References:
CN1295996A2001-05-23
Other References:
JPN6014008217; Tetrahedron Letters Vol.43, No.4, 2002, p.669-71
JPN6014008219; Organic Letters Vol.2, No.13, 2000, p.1867-9
Attorney, Agent or Firm:
Patent Service Corporation Patent Office Sykes