Title:
CENTRIFUGAL SPIN DRYER FOR SEMICONDUCTOR WAFER
Document Type and Number:
Japanese Patent JPH06208986
Kind Code:
A
Abstract:
PURPOSE: To provide an improved centrifugal spin dryer for removing fluid from the surface of a wafer, by generating centrifugal force on a semiconductor wafer while both upper and lower faces of the wafer is rinsed. CONSTITUTION: A centrifugal spin dryer includes a rotatable base board with a variable RPM including a second RPM larger than a first RPM. The base board is rotatable around a first selected axle, and a control arm means 19 separated from the axle is joined with the base board 11 and extended to outside. A carrier 20 for supporting a semiconductor wafer is provided in a way that the lower face of the wafer separated from the base 11 is put opposite to the base 11. A means for joining the carrier 20 to the control arm means 19 in pivot movement and pivoting the carrier 20 around a second selected axle other than the first axle is provided. A nozzle means is provided for blowing fluid to a lower side of the wafer when the wafer is put at a first operational position, in which the wafer is rotated together with the base 11.
Inventors:
JIERARUDO ERU JIRU JIYUNIA
Application Number:
JP40323690A
Publication Date:
July 26, 1994
Filing Date:
December 18, 1990
Export Citation:
Assignee:
JIERARUDO ERU JIRU JIYUNIA
International Classes:
F26B11/08; F26B5/08; H01L21/00; H01L21/304; (IPC1-7): H01L21/304; F26B11/08
Attorney, Agent or Firm:
Minoru Nakamura (7 outside)