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Patent Searching and Data


Title:
CEPHEM COMPOUND, ITS PRODUCTION AND ANTIBACTERIAL AGENT CONTAINING THE COMPOUND
Document Type and Number:
Japanese Patent JPH09110877
Kind Code:
A
Abstract:

To obtain a specific new cephem compound having 7- aminopyrazolo[1,5-a]pyridinium-4-ylmethyl group, etc., at the 3-site of cephem nucleus and exhibiting excellent antibacterial action even on a bacterial strain of the genus Pseudomonas.

This new cephem compound is expressed by formula I [R1 is H or an amino-protecting group; R2 is H, a lower alkyl or fluoromethyl; R3 is H, a lower alkyl or a (protected) carboxyl; R4 is H or a lower alkyl; R5 is H, an anion or a carboxyl-protecting group; A is methylene or propenylene; X is an anion; Q is N or methine; the wavy line is a bond of anti or syn configuration]. It has excellent antibacterial power and is useful, e.g. as an antibacterial agent exhibiting excellent antibacterial effect even on a bacterial strain of the genus Pseudomonas. The compound can be produced by reacting a new compound expressed by formula II with a cephem compound expressed by formula III (Z is a quaternary ammonium salt expressed by formula IV).


Inventors:
HAYASHI SADAO
KURITA YASUYUKI
Application Number:
JP26835895A
Publication Date:
April 28, 1997
Filing Date:
October 17, 1995
Export Citation:
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Assignee:
KATAYAMA SEIYAKUSHIYO KK
International Classes:
A61K31/545; A61P31/04; C07D277/20; C07D277/40; C07D501/00; C07D519/06; (IPC1-7): C07D519/06; A61K31/545
Attorney, Agent or Firm:
Aoyama Ryo (2 outside people)