CERAMIC SUBSTRATE FOR SEMICONDUCTOR PRODUCING/INSPECTING APPARATUS

Title:

CERAMIC SUBSTRATE FOR SEMICONDUCTOR PRODUCING/INSPECTING APPARATUS

Document Type and Number:

Japanese Patent JP3226910

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a ceramic substrate for semiconductor reproducing/ inspecting apparatus suitable as a hot plate, an electrostatic chuck, a wafer probe or a susceptor in which the volume resistivity of 108 Ω.cm or above can be ensured under high temperature while guaranteeing concealability, a high radiation heat quantity and measurement accuracy through a thermoviewer.
SOLUTION: In the ceramic substrate for semiconductor producing/inspecting apparatus, conductors are arranged on a ceramic substrate containing carbon by such a quantity as a peak can not be detected on an X-ray diffraction chart or lower than a detection limit.

More Like This:

WO/2023/160902	SUBSTRATE HANDLING DEVICE FOR HANDLING A SUBSTRATE
JP3316167	INDUSTRIAL APPLICABILITY A method for producing a bonded body of an aluminum nitride base material and a bonding auxiliary agent used thereto.
JP4836512	Board lifting device and board processing device

Inventors:

Yasuji Hiramatsu
Yasutaka Ito

Application Number:

JP36061299A

Publication Date:

November 12, 2001

Filing Date:

December 20, 1999

Export Citation:

Click for automatic bibliography generation Help

Assignee:

IBIDEN Co., Ltd.

International Classes:

H01L21/683; C04B35/581; H01L21/66; H01L21/68; H05B3/10; H05B3/16; (IPC1-7): H01L21/68; C04B35/581; H01L21/66; H05B3/10

Domestic Patent References:

JP948668A
JP945753A

Attorney, Agent or Firm:

Yasuo Yasutomi (2 outside)

Previous Patent: シート貼付装置

Next Patent: DEVICE FOR MANUFACTURING PACKAGING SKID