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Title:
荷電粒子源モジュール、荷電粒子源モジュールを備えた露光システム、荷電粒子源配置、半導体デバイスを製造する方法、及びターゲットを検査する方法
Document Type and Number:
Japanese Patent JP6741879
Kind Code:
B2
Abstract:
The disclosed embodiments relate to a charged particle source module for generating and emitting a charged particle beam, such as an electron beam, comprising: a frame including a first frame part, a second frame part, and one or more rigid support members which are arranged between said first frame part and said second frame part; a charged particle source arrangement for generating a charged particle beam, such as an electron beam, wherein said charged particle source arrangement, such as an electron source, is arranged at said second frame part; and a power connecting assembly arranged at said first frame part, wherein said charged particle source arrangement is electrically connected to said connecting assembly via electrical wiring.

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Inventors:
Dinu-Gültler, Laura
Hogelforst, Eric Petrus
Van Soest, Jurgen
Application Number:
JP2019555242A
Publication Date:
August 19, 2020
Filing Date:
April 10, 2018
Export Citation:
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Assignee:
AS M Netherlands B.V.
International Classes:
H01J1/88; H01J1/92; H01J37/04; H01J37/248; H01L21/027
Domestic Patent References:
JP5580849U
Foreign References:
US20150136995
Other References:
G. de Boer et al.,MAPPER: Progress towards a High Volume Manufacturing system,Proc. of SPIE,2013年 3月26日,vol.8680, #86800O
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito



 
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