Title:
荷電粒子線装置、及び制御方法
Document Type and Number:
Japanese Patent JP7431136
Kind Code:
B2
Abstract:
A charged particle beam apparatus acquires an image that is not affected by movement of a stage at a high speed. The apparatus includes: a charged particle source for irradiating a sample with a charged particle beam; a stage on which the sample is placed; a measurement unit for measuring a movement amount of the stage; a deflector; a deflector offset control unit, which is a feedback control unit for adjusting a deflection amount of the deflector according to the movement amount of the stage; a plurality of detectors for detecting secondary charged particles emitted from the sample by irradiation of the charged particle beam; a composition ratio calculation unit that calculates composition ratios of signals output from the detectors based on the deflection amount adjusted by the feedback control unit; and an image generation unit for generating a composite image by compositing the signals using the composition ratio.
Inventors:
Kaori Bizen
Ryota Watanabe
Suwon Yuzuru
Daisuke Bizen
Ryota Watanabe
Suwon Yuzuru
Daisuke Bizen
Application Number:
JP2020171001A
Publication Date:
February 14, 2024
Filing Date:
October 09, 2020
Export Citation:
Assignee:
Hitachi High-Tech Co., Ltd.
International Classes:
H01J37/22; H01J37/147; H01J37/28
Domestic Patent References:
| JP2008130361A |
Attorney, Agent or Firm:
Polaire Patent Attorneys Corporation