Title:
CHARGED PARTICLE BEAM DEVICE
Document Type and Number:
Japanese Patent JP2018029089
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a processor and a method for processing using a charged particle beam device, the device realizing a large-angle deflection of secondary electrons or reflected electrons and suppressing the positional deviation of primary electron beams caused by a circuit noise of a primary beam/secondary beam separation circuit by cancelling out noise of an electromagnetic deflector and an electrostatic deflector.SOLUTION: The charged particle beam device includes an electronic optical system for emitting an electronic beam focused on a sample on a stage and scanning the sample and is used for imaging the sample. The charged particle beam device includes an overlapping electromagnetic deflector control means for controlling paths of secondary electrons or reflected electrons to be emitted into a detector. The control means commonizes a voltage source control signal reference signal to be applied to an electrostatic deflector generating an electrostatic field and a signal generator, and a current source control signal reference signal to be applied to an electromagnetic deflector generating a magnetostatic field and a signal generator, and making the phase characteristics and the frequency characteristics of the voltage control signal match the phase characteristics and the frequency characteristics of the current source control signal.SELECTED DRAWING: Figure 1
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Inventors:
RI UEN
KADOI RYO
IKEDA KAZUKI
TAKAHASHI HIROYUKI
KAWANO HAJIME
KADOI RYO
IKEDA KAZUKI
TAKAHASHI HIROYUKI
KAWANO HAJIME
Application Number:
JP2017230024A
Publication Date:
February 22, 2018
Filing Date:
November 30, 2017
Export Citation:
Assignee:
HITACHI HIGH TECH CORP
International Classes:
H01J37/05; H01J37/29
Domestic Patent References:
| JPH0260042A | 1990-02-28 | |||
| JPH02142045A | 1990-05-31 |
Attorney, Agent or Firm:
Aoritsu patent business corporation