Charged particle beam device - Hitachi High-Technologies Corporation

Title:

Charged particle beam device

Document Type and Number:

Japanese Patent JP5914020

Kind Code:

B2

Abstract:

An object of the present invention is to provide a charged particle beam apparatus that effectively removes electrical charges from an electrostatic chuck. In order to achieve the above object, the charged particle beam apparatus of the present invention includes a sample chamber that maintains a space containing an electrostatic chuck mechanism (5) in a vacuum state; and in which the charged particle beam apparatus includes an ultraviolet light source (6) to irradiate ultraviolet light within the sample chamber, and a irradiation target member irradiated by the ultraviolet light; and the irradiation target member is placed perpendicular to the adsorption surface of the electrostatic chuck.

More Like This:

WO/2004/008475	ION BEAM DEVICE AND ION BEAM PROCESSING METHOD, AND HOLDER MEMBER
JP5539406	Lithography machine and substrate processing component
JP7277765	Error calculation device, charged particle beam device, error calculation method and program

Inventors:

Ebisuka Yasushi
Seiichiro Kanno
Nishihara Makoto
Masashi Fujita

Application Number:

JP2012025676A

Publication Date:

May 11, 2016

Filing Date:

February 09, 2012

Export Citation:

Click for automatic bibliography generation Help