Title:
Charged particle beam device
Document Type and Number:
Japanese Patent JP6210931
Kind Code:
B2
Abstract:
A charged-particle-beam device used for measuring the dimensions, etc., of fine circuit patterns in a semiconductor manufacturing process, wherein corrections are made in the defocusing and astigmatism generated during changes in the operating conditions of a Wien filter acting as a deflector of secondary signals such as secondary electrons, and the display dimensions of obtained images are kept constant. In the charged-particle-beam device, the Wien filter (23) is arranged between a detector and a lens (11) arranged on the test-sample side among two stages of lenses for converging a charged-particle beam, and a computing device (93) is provided for the interlocked control of the Wien filter (23) and a lens (12) arranged on the charged-particle-source side among the two stages of lenses.
Inventors:
Takahashi Noriji
Yasunari Hayada
Wataru Mori
Yuko Sasa
Kawano Gen
Yasunari Hayada
Wataru Mori
Yuko Sasa
Kawano Gen
Application Number:
JP2014099672A
Publication Date:
October 11, 2017
Filing Date:
May 13, 2014
Export Citation:
Assignee:
Hitachi High-Technologies Corporation
International Classes:
H01J37/153; H01J37/05; H01J37/147; H01J37/21; H01J37/244; H01J37/28
Domestic Patent References:
| JP2008243485A | ||||
| JP2004342341A |
Foreign References:
| US7041976 |
Attorney, Agent or Firm:
Yusuke Hiraki
Sekiya Mitsuo
Toshiaki Watanabe
Sekiya Mitsuo
Toshiaki Watanabe
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