Title:
荷電粒子線装置
Document Type and Number:
Japanese Patent JP6909859
Kind Code:
B2
Abstract:
In order to optimize defect contrast in a charged particle beam device that inverts charged particles directly above a sample and observes the electrons, this charged particle beam device is provided with a charged particle source, an electron gun control device which applies a first voltage to the charged particle source, a substrate voltage control device which applies a second voltage to a sample, an image forming optical system which includes an imaging lens for imaging charged particles incident from the direction of the sample, a detector which includes a camera for detecting the charged particles, and an image processing device which processes the detected signal, wherein the imaging optical system is configured so as not to image secondary electrons emitted from the sample, but forms an image with mirror electrons bounced back by the electric field formed on the sample by means of the potential difference between the first and the second voltages. The image processing device generates a control signal for controlling the potential difference on the basis of the acquired signal, and optimizes defect contrast by controlling the reflection surface of the mirror electrons.
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Inventors:
Tomohiko Ogata
Masaki Hasegawa
Katsunori Konuki
Noriyuki Kaneoka
Hisaya Murakoshi
Masaki Hasegawa
Katsunori Konuki
Noriyuki Kaneoka
Hisaya Murakoshi
Application Number:
JP2019542853A
Publication Date:
July 28, 2021
Filing Date:
September 20, 2017
Export Citation:
Assignee:
Hitachi High-Tech Co., Ltd.
International Classes:
H01J37/22; H01J37/05; H01J37/244; H01J37/28; H01J37/29
Domestic Patent References:
| JP2007207688A | ||||
| JP5744248B2 | ||||
| JP2013092530A |
Foreign References:
| WO2016002003A1 |
Other References:
品田 博之、島倉 智一、長谷川 正樹,次世代の高速高感度検査-ミラー電子顕微鏡技術の可能性-,日立評論,日本,日立評論社,2012年 2月 1日,第2号,46-51
Attorney, Agent or Firm:
Polaire Patent Business Corporation