Title:
荷電粒子線装置
Document Type and Number:
Japanese Patent JP7307272
Kind Code:
B2
Abstract:
Improved is the reliability of sample analysis performed using a charged particle beam apparatus.The charged particle beam apparatus includes region setting means for setting an irradiation region for irradiating a sample with an electron beam and an irradiation prohibited region for prohibiting the irradiation of the sample with the electron beam using a low-magnification image of the sample captured under low vacuum. In addition, the charged particle beam apparatus includes captured image acquisition means for selectively irradiating the irradiation region with the electron beam with the inside of a sample chamber under high-vacuum and acquiring a high-vacuum SEM image of the irradiation region based on the secondary or backscattered electrons emitted from the irradiation region.
Inventors:
Mai Yoshihara
Weijian Chen
Weijian Chen
Application Number:
JP2022510243A
Publication Date:
July 11, 2023
Filing Date:
March 26, 2020
Export Citation:
Assignee:
Hitachi High-Tech Co., Ltd.
International Classes:
H01J37/28; H01J37/18; H01J37/22; H01J37/244
Domestic Patent References:
| JP2009192428A | ||||
| JP201190940A | ||||
| JP487148A | ||||
| JP2006292682A | ||||
| JP230724A |
Attorney, Agent or Firm:
Patent Attorney Tsutsui International Patent Office
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