Title:
荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
Document Type and Number:
Japanese Patent JP7017129
Kind Code:
B2
Abstract:
To reduce deviation of a drawing position of a beam.SOLUTION: A charged particle beam lithography apparatus comprises: a stage on which a substrate of a drawing object is mounted and which can be moved; a drawing part that draws a pattern on a surface of a substrate mounted onto the stage moving by using a charged particle beam; a measurement part that measures a height distribution of the substrate mounted on the stage in rest; a correction part that adds a height fluctuation of the substrate on the basis of a moving speed of the stage to a substrate surface height of a drawing position calculated by the height distribution of the substrate to correct the substrate surface height at the drawing position; and a control part that adjusts a focal position of the charged particle beam on the basis of the substrate surface height at the drawing position.SELECTED DRAWING: Figure 1
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Inventors:
Takahito Nakayama
Rieko Nishimura
Watanabe Dry Castle
Takahashi Masazumi
Hiroo Ishikawa
Rieko Nishimura
Watanabe Dry Castle
Takahashi Masazumi
Hiroo Ishikawa
Application Number:
JP2018151710A
Publication Date:
February 08, 2022
Filing Date:
August 10, 2018
Export Citation:
Assignee:
New Flare Technology Co., Ltd.
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP2012151371A | ||||
| JP2012160574A | ||||
| JP2006203067A | ||||
| JP2001283760A | ||||
| JP2010123694A |
Foreign References:
| US20150355547 |
Attorney, Agent or Firm:
Tsuyoshi Shigeno
Takayuki Shigeno
Takayuki Shigeno
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