To perform positional information acquiring operation at a high-speed in a comparatively simple circuit constitution, and to shorten the time required for the positional information acquisition, then to contribute to improve the throughput drastically, in a charged particle beam exposing device.

A deflection data holding/generating means 11 holding and generating the main deflection data for at least a main deflector 2 as the deflection data required for irradiating a charged particle beam on the desired position on a sample to be exposed is used in common, when the positional information for a pattern positioning mark is acquired before the initiation of the exposure, and when the exposure of the pattern is performed.