To provide a charged particle beam exposure apparatus for exposing a desired pattern by suppressing the generation of other aberrations when performing an astigmatic correction of an electronic optical system for contraction.

The apparatus includes a beam shaping optical system 2 for forming an image SI of a charged particle source radiating a charged particle beam; an aperture array 5 and an electrostatic lens 6 for forming images of a plurality of charged particle sources from the image SI; a reducing electronic optical system 8 for contraction projecting a reduced size of the images of the plurality of charged particle sources on a wafer 9; and a first stigmeter 3 for generating astigmatic aberrations when the optical system 2 forms the image SI so as to correct the astigmatic aberrations which are generated in the optical system 8 for contraction.