To eliminate shift of an axis in a lens field by a magnetic pole from an axis in a lens field by a coil, even if a magnetic pole gap of an electromagnetic lens is widened.

An electron beam 1 passing through a reticule 2 forms a pattern image on the reticule 2 on a wafer 7 by a first projection lens composed of a magnetic pole 3 and a coil 4 and a second projection lens composed of a magnetic pole 5 and a coil 6. If a magnetic pole gap 8 of an electromagnetic lens is widen, axial magnetic field to determine electro-optical performance of the projection lens system is influenced not only by the pole shape but also by the coil shape, therefore they are required to match. Since a coil position adjusting knob is provided, a divergence of an axis in the lens field by the magnetic pole from an axis in the lens field by the coil is eliminated by adjusting positions of the coils 4, 6 by this knob.