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Patent Searching and Data


Title:
CHARGED PARTICLE BEAM MACHINING DEVICE
Document Type and Number:
Japanese Patent JPS5545513
Kind Code:
A
Abstract:

PURPOSE: To adjust the focusing position of the electron beam of the part to be machined to perform machining evenly and improve performance by providing a position adjusting means to the focusing means of charged particle beams.

CONSTITUTION: After the work 5 is positioned on a stage 4, the specified vacuum state is maintained by the exhaust device connected to the opening part 101 of a vacuum chamber 1. Thereafter, a focusing means 8 is adjusted approximately right under an electron beam generator 6 by an adjusting means 12. Next, the position of the focusing means 8 is so adjusted that the electron beam 7 generated radiates the machining part. Then, while the moving table 3 and work 5 are being moved in the direction of X1 or X2, machining is accomplished. If at this time, the surface of the work 5 is not even and has a serration t, then the focusing means 8 is lowered by the height corresponding to the height t by an adjusting mechanism 121. If the adjusting means 12 is made adjustable with respect to the X-axis, Y-axis, Z-axis, then fine adjustment may be accomplished.


Inventors:
TAKEMOTO ASAKI
MOCHIDA SEIJI
Application Number:
JP11706578A
Publication Date:
March 31, 1980
Filing Date:
September 22, 1978
Export Citation:
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Assignee:
OSAKA TRANSFORMER CO LTD
International Classes:
H01J37/315; B23K15/00; B23K15/02; (IPC1-7): B23K15/00; H01J37/315
Domestic Patent References:
JPS463897A
JPS52103965A1977-08-31