Title:
CHARGED PARTICLE BEAM SYSTEM AND OVERLAY MISALIGNMENT MEASUREMENT METHOD
Document Type and Number:
Japanese Patent JP2021034163
Kind Code:
A
Abstract:
To enable high-accuracy measurement of an overlay misalignment amount.SOLUTION: A charged particle beam system includes a computer system that measures an overlay misalignment amount between a first layer of a sample and a second layer below the first layer on the basis of an output of a detector. The computer system generates a first image P1 for the first layer and a second image P2 for the second layer on the basis of the output of the detector. First images of a first addition number are added to generate a first addition image P1o, and second images of a second addition number larger than the first addition number are added to generate a second addition image P2o. On the basis of the first addition image and the second addition image, an overlay misalignment amount between the first layer and the second layer is measured.SELECTED DRAWING: Figure 2
Inventors:
YAMAKI TAKUMA
YAMAMOTO TAKUMA
GOTO YASUNORI
TAMORI TOMOHIRO
ASAO KAZUNARI
YAMAMOTO TAKUMA
GOTO YASUNORI
TAMORI TOMOHIRO
ASAO KAZUNARI
Application Number:
JP2019150662A
Publication Date:
March 01, 2021
Filing Date:
August 20, 2019
Export Citation:
Assignee:
HITACHI HIGH TECH CORP
International Classes:
H01J37/22; G01B15/04; H01L21/66
Attorney, Agent or Firm:
Hiraki International Patent Office