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Title:
CHARGED PARTICLE MICROSCOPE WITH SPECIAL APERTURE PLATE
Document Type and Number:
Japanese Patent JP2016081929
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To improve a charged particle microscope.SOLUTION: A charged particle microscope includes: a specimen holder for holding a specimen; a beam source for producing a charged particle beam; an illuminator for directing the beam so as to irradiate the specimen; a detector for detecting a flux of radiation emitted from the specimen in response to the irradiation. The illuminator includes an aperture plate having an aperture region in a path of the beam, for defining a geometrical shape of the beam prior to the impingement of the beam upon the specimen. The aperture region has a distribution of a plurality of holes, and each of the holes is smaller than a diameter of the beam incident on the aperture plate.SELECTED DRAWING: Figure 2A

Inventors:
PAVEL POTOCEK
FRANCISCUS MARTINUS HENRICUS MARIA VAN LAARHOVEN
FAYSAL BOUGHORBEL
REMCO SCHOENMAKERS
PETER CHRISTIAN TIEMEIJER
Application Number:
JP2015203388A
Publication Date:
May 16, 2016
Filing Date:
October 15, 2015
Export Citation:
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Assignee:
FEI CO
International Classes:
H01J37/09; H01J37/21; H01J37/26; H01J37/28
Domestic Patent References:
JPH07320674A1995-12-08
JP2007522654A2007-08-09
JPH07320674A1995-12-08
JP2007522654A2007-08-09
Foreign References:
WO2010035386A12010-04-01
WO2010035386A12010-04-01
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Shinsuke Onuki