Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
CHEMICAL AMPLIFICATION RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2002006501
Kind Code:
A
Abstract:

To provide a resist composition, superior in transmittance to a light of ≤170 nm wavelength and suitable particularly for use in F2 excimer laser lithography.

The chemical amplification resist composition contains a resin binder and a radiation-sensitive compound. The resin binder is alkali-soluble or is made alkali-soluble by chemical changes caused by the action of the radiation sensitive compound after irradiation and has a polymerization unit, derived from a monomer of formula (I) (where Q is H, methyl or a 1-4C fluoroalkyl; R1 is a 1-14C alkyl which may be substituted by halogen, hydroxyl or an alicyclic ring, or an alicyclic or lactone ring which in turn may be substituted by halogen, hydroxyl or alkyl; and at least one of Q and R1 has at least one fluorine atom).


Inventors:
KAMIYA YASUNORI
HASHIMOTO KAZUHIKO
MIYA YOSHIKO
INOUE HIROTAKA
Application Number:
JP2000332641A
Publication Date:
January 09, 2002
Filing Date:
October 31, 2000
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/039; C08F220/18; C08F220/22; C08F222/04; C08F232/00; C08K5/00; C08L33/06; C08L33/16; C08L35/00; C08L45/00; G03F7/004; G03F7/038; H01L21/027; (IPC1-7): G03F7/039; C08F220/18; C08F220/22; C08F222/04; C08F232/00; C08K5/00; C08L33/06; C08L33/16; C08L35/00; C08L45/00; G03F7/004; G03F7/038; H01L21/027
Domestic Patent References:
JPH11305444A1999-11-05
JPH11258801A1999-09-24
JPH1184659A1999-03-26
JPH10319593A1998-12-04
JPH1010752A1998-01-16
JPH0943848A1997-02-14
JP2001154362A2001-06-08
JPH08250416A1996-09-27
JP2000321774A2000-11-24
Attorney, Agent or Firm:
Takashi Kuboyama (2 outside)



 
Previous Patent: METHOD FOR PREDICTING CHARACTERISTIC IN CHEMICAL AMPLIFICATION RESIST MATERIAL

Next Patent: (CO)POLYMER FOR RESIST AND RESIST COMPOSITION