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Patent Searching and Data


Title:
CHEMICAL-AMPLIFICATION-TYPE RESIST COMPOSITION CONTAINING FLUOROPOLYMER
Document Type and Number:
Japanese Patent JP2006072383
Kind Code:
A
Abstract:

To provide a chemical-amplification-type resist composition containing a polymer containing a repeating unit derived from perfluoro-2,2-dimethyl-1,3-dioxole.

The resist composition includes: (a) a photosensitive polymer comprising (a-1) a repeating unit expressed by chemical formula derived from perfluoro-2,2-dimethyl-1,3-dioxole and (a-2) a repeating unit derived from vinyl; and (b) a photoacid generator.


Inventors:
Kim, Hyun-woo
Application Number:
JP2005000311833
Publication Date:
March 16, 2006
Filing Date:
October 26, 2005
Export Citation:
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Assignee:
SAMSUNG ELECTRONICS CO LTD
International Classes:
G03F7/039; C08F210/02; C08F214/06; C08F214/18; C08F216/00; C08F216/02; C08F216/14; C08F224/00; C08F232/08; C08F234/00; C08F234/02; G03F7/004; H01L21/027
Attorney, Agent or Firm:
八田 幹雄
奈良 泰男
宇谷 勝幸