Title:
CHEMICAL AMPLIFICATION TYPE RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP3393915
Kind Code:
B2
Abstract:
PURPOSE: To obtain a resist compsn. excellent in various properties such as coatability, the depth of a focus, sensitivity and resolution in an exposure region using far UV including excimer laser light as a light source.
CONSTITUTION: This resist compsn. is a negative type photoresist compsn. contg. an alkali-soluble resin, a crosslinking agent, an optical acid generating agent contg. at least one kind of sulfonic ester of an N-hydroxyimido compd. and polysiloxane having a low polymn. degree or a positive type photoresist compsn. contg. an alkali-soluble resin, a dissolution inhibitor, an optical acid generating agent contg. at least one kind of sulfonic ester of an N-hydroxyimido compd. and polysiloxane having a low polymn. degree.
Inventors:
Yuko Nakano
Naoki Takeyama
Yuji Ueda
Takehiro Kusumoto
Hiromi Ueki
Naoki Takeyama
Yuji Ueda
Takehiro Kusumoto
Hiromi Ueki
Application Number:
JP3483694A
Publication Date:
April 07, 2003
Filing Date:
March 04, 1994
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
G03F7/038; C08K5/46; C08L83/04; G03F7/004; G03F7/031; G03F7/039; G03F7/075; H01L21/027; (IPC1-7): G03F7/038; G03F7/004; H01L21/027
Domestic Patent References:
| JP692909A | ||||
| JP5341531A | ||||
| JP3206458A | ||||
| JP4366958A | ||||
| JP5210239A | ||||
| JP643647A | ||||
| JP6214391A | ||||
| JP7295220A | ||||
| JP61166544A | ||||
| JP59155836A | ||||
| JP5507563A |
Attorney, Agent or Firm:
Takashi Kuboyama
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