Title:
CHEMICAL-AMPLIFICATION-TYPE RESIST COMPOSITION CONTAINING FLUOROPOLYMER
Document Type and Number:
Japanese Patent JP3800554
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a chemical-amplification-type resist composition containing a polymer containing a repeating unit derived from perfluoro-2,2-dimethyl-1,3-dioxole.
SOLUTION: The resist composition includes: (a) a photosensitive polymer comprising (a-1) a repeating unit expressed by chemical formula derived from perfluoro-2,2-dimethyl-1,3-dioxole and (a-2) a repeating unit derived from vinyl; and (b) a photoacid generator.
More Like This:
Inventors:
Kim wise friend
Application Number:
JP2005311833A
Publication Date:
July 26, 2006
Filing Date:
October 26, 2005
Export Citation:
Assignee:
Samsung Electronics Co.,Ltd.
International Classes:
G03F7/039; C08F210/02; C08F214/06; C08F214/18; C08F216/00; C08F216/02; C08F216/14; C08F224/00; C08F232/08; C08F234/00; C08F234/02; G03F7/004; H01L21/027
Domestic Patent References:
| JP2002169287A | ||||
| JP2001330955A | ||||
| JP5838707A | ||||
| JP58103385A | ||||
| JP3502585A | ||||
| JP7233224A | ||||
| JP1045853A |
Attorney, Agent or Firm:
Mikio Hatta
Yasuo Nara
Katsuyuki Utani
Yasuo Nara
Katsuyuki Utani