CHEMICAL AMPLIFICATION TYPE RESIST MATERIAL

Title:

CHEMICAL AMPLIFICATION TYPE RESIST MATERIAL

Document Type and Number:

Japanese Patent JP2006293380

Kind Code:

A

Abstract:

To provide a chemical amplification type resist material which ensures a high resolution, good resist pattern profile and improved storage stability.

A polymer using an ester of (meth)acrylic acid, bicycloheptenecarboxylic acid or bicycloheptenedicarboxylic acid having an acid decomposable group as raw material, and having a narrow molecular weight dispersity because a low-molecular-weight component has been removed is used in the chemical amplification type resist material.

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Inventors:

TAKEDA TAKANOBU
WATANABE OSAMU
WATANABE ATSUSHI
HATAKEYAMA JUN
NISHI TSUNEHIRO
KANOU TAKESHI

Application Number:

JP2006132581A

Publication Date:

October 26, 2006

Filing Date:

May 11, 2006

Export Citation:

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Assignee:

SHINETSU CHEMICAL CO

International Classes:

G03F7/039; C08F222/06; C08F232/00; G03F7/033; H01L21/027

Attorney, Agent or Firm:

Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa

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