Title:
CHEMICAL AMPLIFICATION TYPE RESIST MATERIAL
Document Type and Number:
Japanese Patent JP2006293380
Kind Code:
A
Abstract:
To provide a chemical amplification type resist material which ensures a high resolution, good resist pattern profile and improved storage stability.
A polymer using an ester of (meth)acrylic acid, bicycloheptenecarboxylic acid or bicycloheptenedicarboxylic acid having an acid decomposable group as raw material, and having a narrow molecular weight dispersity because a low-molecular-weight component has been removed is used in the chemical amplification type resist material.
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Inventors:
TAKEDA TAKANOBU
WATANABE OSAMU
WATANABE ATSUSHI
HATAKEYAMA JUN
NISHI TSUNEHIRO
KANOU TAKESHI
WATANABE OSAMU
WATANABE ATSUSHI
HATAKEYAMA JUN
NISHI TSUNEHIRO
KANOU TAKESHI
Application Number:
JP2006132581A
Publication Date:
October 26, 2006
Filing Date:
May 11, 2006
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
International Classes:
G03F7/039; C08F222/06; C08F232/00; G03F7/033; H01L21/027
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa