Title:
薬液、キット、パターン形成方法、薬液の製造方法及び薬液収容体
Document Type and Number:
Japanese Patent JP7453435
Kind Code:
B2
Abstract:
An object of the present invention is to provide a chemical liquid which exhibits excellent defect inhibition performance even after long-term preservation, a kit, a pattern forming method, a chemical liquid manufacturing method, and a chemical liquid storage body. The chemical liquid according to an embodiment of the present invention is a chemical liquid containing an organic solvent, an acid component, and a metal component. The content of the acid component is equal to or greater than 1 mass ppt and equal to or smaller than 15 mass ppm with respect to the total mass of the chemical liquid. The content of the metal component is 0.001 to 100 mass ppt with respect to the total mass of the chemical liquid.
Inventors:
Tadashi Ohmatsu
Tetsuya Uemura
Tetsuya Shimizu
Tomomi Takahashi
Akihiko Otsu
Tetsuya Uemura
Tetsuya Shimizu
Tomomi Takahashi
Akihiko Otsu
Application Number:
JP2023005746A
Publication Date:
March 19, 2024
Filing Date:
January 18, 2023
Export Citation:
Assignee:
Fujifilm Corporation
International Classes:
G03F7/32; G03F7/038; G03F7/039; G03F7/16; H01L21/027
Domestic Patent References:
| JP2012047896A |
Foreign References:
| WO2017188296A1 | ||||
| WO2018061485A1 | ||||
| WO2018043695A1 | ||||
| WO2018084302A1 | ||||
| WO2018061573A1 |
Attorney, Agent or Firm:
Hideaki Ito
Fumio Mihashi
Fumio Mihashi
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