Title:
CHEMICAL POLISHING SOLUTION FOR GLASS SUBSTRATE, AND METHOD FOR POLISHING GLASS SUBSTRATE USING THE SAME
Document Type and Number:
Japanese Patent JP2011236100
Kind Code:
A
Abstract:
To provide a chemical polishing solution for a glass substrate, which is used for polishing the surface of the glass substrate to reduce the thickness of the substrate and has a life longer than that of a conventional one.
The chemical polishing solution for a glass substrate includes: 0.5-10 vol.% (preferably 1-8 vol.%, more preferably 2-8 vol.%) of a mixed solution composed of hydrofluoric acid and ammonium fluoride; and 20-60 vol.% of an acid solution of at least one kind selected from among hydrochloric acid, sulfuric acid, phosphoric acid, nitric acid and acetic acid.
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Inventors:
SATO HIDEMI
OBARA KATSUMI
AOKI YUKA
OBARA KATSUMI
AOKI YUKA
Application Number:
JP2010110904A
Publication Date:
November 24, 2011
Filing Date:
May 13, 2010
Export Citation:
Assignee:
HITACHI DISPLAYS LTD
PANASONIC LIQUID CRYSTAL DISPL
PANASONIC LIQUID CRYSTAL DISPL
International Classes:
C03C15/00; G02F1/1333
Domestic Patent References:
| JP2004339036A | 2004-12-02 |
Attorney, Agent or Firm:
Akita Haruki
Keiichi Chino
Haruka International Patent Office
Keiichi Chino
Haruka International Patent Office