Title:
CHEMICAL SOLUTION SUPPLY SYSTEM AND METHOD
Document Type and Number:
Japanese Patent JP2022019673
Kind Code:
A
Abstract:
To provide a chemical solution supply system and a chemical solution supply method that suppress dust and fine particle contamination by appropriately controlling the triboelectric charge amount of the system.SOLUTION: A chemical solution supply system 10a includes a chemical storage tank 100, a pipeline 110, a pump 120, a first electrostatic probe 130a, a control unit 140, and a processing tool 150. The pipeline is connected to the chemical storage tank. The pump is connected to the pipeline and pumps the chemical solution from the chemical storage tank into the pipeline. The first electrostatic probe is coupled to the pump and measures an electrostatic voltage of the pump. The control unit is coupled to the first electrostatic probe and acquires a measured value of the electrostatic voltage from the first electrostatic probe. The processing tool include an etcher, a wet cleaner, and a photolithography system.SELECTED DRAWING: Figure 1
Inventors:
CENG ZHI JIANG
LI MING LI
CHEN QIANG ZE
LI MING LI
CHEN QIANG ZE
Application Number:
JP2021117596A
Publication Date:
January 27, 2022
Filing Date:
July 16, 2021
Export Citation:
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTUARING CO LTD
International Classes:
H01L21/304; F16L55/00; H05F1/00
Attorney, Agent or Firm:
Nishimura Ryuhei
Shindai Saito
Nakamura Atsushi
Haruko Maeda
Shindai Saito
Nakamura Atsushi
Haruko Maeda
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