Title:
金属被膜の化学蒸着法
Document Type and Number:
Japanese Patent JP4079591
Kind Code:
B2
Abstract:
A method of producing a thick metal film on a substrate surface with a substantially smooth surface morphology and low resistivity. A substrate is exposed to a plasma. A first thin metal film is deposited on the substrate by chemical vapor deposition. The substrate with the film deposited thereon is exposed to a plasma, and a second thin metal film is deposited on top of the first film. The substrate may undergo subsequent cycles of plasma exposure and film deposition until a desired film thickness is obtained. The resulting film has a smooth surface morphology and low resistivity.
Inventors:
Arena, Chantal
Bertram, Ronald, Tee
Guidotti, Emanuel
Hillman, Joseph, Tee
Bertram, Ronald, Tee
Guidotti, Emanuel
Hillman, Joseph, Tee
Application Number:
JP2000516079A
Publication Date:
April 23, 2008
Filing Date:
October 07, 1998
Export Citation:
Assignee:
トーキョー エレクトロン アリゾナ インコーポレイテッド
東京エレクトロン株式会社
東京エレクトロン株式会社
International Classes:
C23C16/18; C23C16/02; C23C16/44; C23C16/56
Domestic Patent References:
| JP8262477A | ||||
| JP8213343A | ||||
| JP9172083A | ||||
| JP63283119A | ||||
| JP63275114A |
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Sadafumi Kobori
Yukihiro Ikeda
Hajime Asamura
Sadafumi Kobori
Yukihiro Ikeda