Title:
Chemical vapor deposition process for forming a silica film on a glass substrate
Document Type and Number:
Japanese Patent JP6320303
Kind Code:
B2
Abstract:
A CVD process for depositing a silica coating is provided. The process includes providing a float glass ribbon in a float glass manufacturing process. The process also includes forming a gaseous mixture including a silane compound, oxygen, a fluorine-containing compound, and a radical scavenger. The gaseous mixture is directed toward and along the float glass ribbon and is reacted over the float glass ribbon to form the silica coating thereon. The silica coating comprises silicon dioxide.
Inventors:
Douglas Martin Nelson
Michael Martin Radetsky
Stephen Edward Phillips
Michael Martin Radetsky
Stephen Edward Phillips
Application Number:
JP2014558199A
Publication Date:
May 16, 2018
Filing Date:
February 18, 2013
Export Citation:
Assignee:
Pilkington Group Limited
International Classes:
C03C17/245; C03C17/34; C23C16/42; C23C16/455
Domestic Patent References:
| JP62099463A | ||||
| JP10506874A | ||||
| JP2003231968A | ||||
| JP9008030A | ||||
| JP2007190844A | ||||
| JP2003535004A | ||||
| JP2001035262A | ||||
| JP59190209A |
Foreign References:
| US6583069 |
Attorney, Agent or Firm:
Kenji Sugimura
Koichiro God
Soichiro Senuma
Koichiro God
Soichiro Senuma