Title:
化学蒸着システム及び方法
Document Type and Number:
Japanese Patent JP3821647
Kind Code:
B2
Abstract:
A chemical vapor deposition (CVD) system is provided for processing a substrate 110. The system 100 includes a heated muffle 115, a chamber 120 having an injector assembly 130 for introducing chemical vapor to process the substrate 110, and a belt 105 for moving the substrate through the muffle and chamber. The belt 105 has an oxidation-resistant coating 175 to reduce formation of deposits thereon. The coating 175 is particularly useful for resisting formation of chromium oxides on belts made from a chromium-containing alloy. In one embodiment, the oxidation-resistant coating 175 comprises a securely-adhered oxide layer 185 that is substantially free of transition metals. Preferably, the oxidation-resistant coating 175 comprises aluminum oxide. More preferably, the coating 175 comprises an aluminum oxide layer 185 securely adhered over a nickel aluminide layer 180.
Inventors:
Bailey Robert Jay
Michael Lisa H
Kane Tomas Y
Michael Lisa H
Kane Tomas Y
Application Number:
JP2000613851A
Publication Date:
September 13, 2006
Filing Date:
March 03, 2000
Export Citation:
Assignee:
AMS MULS Inc.
International Classes:
B05D3/10; C23C16/44; B01J19/00; C23C10/48; C23C16/54; C23C28/00; C23C30/00
Domestic Patent References:
| JP9157866A | ||||
| JP5178664A |
Foreign References:
| WO1998040534A1 |
Attorney, Agent or Firm:
Minoru Nakamura
Fumiaki Otsuka
Sadao Kumakura
Shishido Kaichi
Hideto Takeuchi
Toshio Imajo
Nobuo Ogawa
Village shrine Atsuo
Takaki Nishijima
Atsushi Hakoda
Fumiaki Otsuka
Sadao Kumakura
Shishido Kaichi
Hideto Takeuchi
Toshio Imajo
Nobuo Ogawa
Village shrine Atsuo
Takaki Nishijima
Atsushi Hakoda