Title:
CHEMICALLY AMPLIFIABLE POSITIVE RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2000275843
Kind Code:
A
Abstract:
To provide the chemically amplified positive resist composition enhanced in adhesiveness to a substrate and dry etching resistance and improved in sensitivity and resolution.
The chemically amplified positive resist composition contains a polymer having 2-hydroxyethyl methacrylate polymerization units and polymerization units each having an acid-instable group, and itself being insoluble or hardly soluble in alkali but solubilizable in alkali, when the above acid-instable groups are cleft, and an acid generating agent. This polymer may have other units of monomer, such as 3-hydroxy-1-adamantyl (meth)acrylate, α-(meth) acryloyloxy-γ-butyrolactone (this lactone being optionally substituted by alkyl group) or maleic anhydride.
Inventors:
FUJISHIMA HIROAKI
KAMIYA YASUNORI
ARAKI KO
KAMIYA YASUNORI
ARAKI KO
Application Number:
JP8360599A
Publication Date:
October 06, 2000
Filing Date:
March 26, 1999
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
H01L21/027; G03F7/039; (IPC1-7): G03F7/039; H01L21/027
Attorney, Agent or Firm:
Takashi Kuboyama (1 person outside)