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Title:
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS
Document Type and Number:
Japanese Patent JP2008249762
Kind Code:
A
Abstract:

To provide a chemically amplified negative resist composition less liable to cause bridges and having small substrate dependency of a pattern thereof, and to provide a patterning process using the same.

The chemically amplified negative resist composition comprises a polymer comprising recurring units represented by general formula (4) (wherein R1 and R2 each independently represent a hydrogen atom or a methyl group; X represents an electron withdrawing group; m is 0 or an integer of 1-4; and n is an integer of 1-5) and having a weight average molecular weight of 1,000-50,000.


Inventors:
Takeda, Takanobu
Watanabe, Tamotsu
Koitabashi, Ryuji
Masunaga, Keiichi
Watanabe, Osamu
Tanaka, Haruyori
Application Number:
JP2007000087243
Publication Date:
October 16, 2008
Filing Date:
March 29, 2007
Export Citation:
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Assignee:
SHIN ETSU CHEM CO LTD
International Classes:
G03F7/038; C08F12/02; C08F210/14; C08F232/08; H01L21/027
Domestic Patent References:
JP2007140070A2007-06-07
JP2002278068A2002-09-27
JP2003121999A2003-04-23
JP2001281864A2001-10-10
JP2006201532A2006-08-03
JP2002174904A2002-06-21
JP2004101811A2004-04-02
JP2008077057A2008-04-03
JP2005062800A2005-03-10
Attorney, Agent or Firm:
小島 隆司
重松 沙織
小林 克成
石川 武史