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Patent Searching and Data


Title:
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
Document Type and Number:
Japanese Patent JP2013164588
Kind Code:
A
Abstract:

To provide a chemically amplified negative resist composition which improves resolution, prevents errors caused by kinds of patterns and line widths even when a dense pattern and a sparse pattern are formed, and enables desired line widths to be faithfully printed.

A chemically amplified negative resist composition contains a polymer including recurring units of the general formula (1), having a phenolic hydroxyl group and/or a fluoroalcohol group, and comprising recurring units other than those of the general formula (1) the total of which accounts for 25 to 95 mol%.


Inventors:
Masunaga, Keiichi
Watanabe, Satoshi
Kawai, Yoshio
Luisa, Bozano
Sooriyakumaran, Ratnam
Application Number:
JP2013000018391
Publication Date:
August 22, 2013
Filing Date:
February 01, 2013
Export Citation:
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Assignee:
SHIN ETSU CHEM CO LTD
INTERNATL BUSINESS MACH CORP
International Classes:
G03F7/038; C08F212/02; C08F220/30; C08F232/08; G03F7/09; H01L21/027
Domestic Patent References:
JP2003337414A2003-11-28
JP2010276910A2010-12-09
JP2006201532A2006-08-03
JP2014145885A2014-08-14
Attorney, Agent or Firm:
小島 隆司
重松 沙織
小林 克成
石川 武史
正木 克彦