Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERNING PROCESS
Document Type and Number:
Japanese Patent JP2018109764
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a positive resist composition that has improved resolution in patterning and can form a resist pattern with reduced LER.SOLUTION: A positive resist composition comprises (A) a sulphonium compound represented by formula (1), and (B) a base polymer comprising a polymer that comprises a repeating unit having an aromatic group with a hydroxy group in its side chain and that decomposes under the action of acid to increase its solubility in alkaline developer.SELECTED DRAWING: None

Inventors:
KOTAKE MASAAKI
MASUNAGA KEIICHI
WATANABE SATOSHI
OHASHI MASAKI
Application Number:
JP2017247661A
Publication Date:
July 12, 2018
Filing Date:
December 25, 2017
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SHINETSU CHEMICAL CO
International Classes:
G03F7/004; C08F12/24; C08F20/30; C08F212/02; C08F212/14; C08F220/12; C08F220/30; C08F220/38; C08F232/08; G03F7/039; G03F7/09; G03F7/20
Domestic Patent References:
JP2013061642A2013-04-04
JP2016099535A2016-05-30
Attorney, Agent or Firm:
Hideaki International Patent Office