Title:
化学増幅型ポジ型レジスト組成物
Document Type and Number:
Japanese Patent JP4529245
Kind Code:
B2
Abstract:
A chemically amplified positive resist composition is provided which is excellent in sensitivity and resolution; and comprises a resin (X) which, per se, is insoluble or slightly soluble in alkali but becomes soluble in alkali by the action of acid, and has a polymeric unit (a) derived from an alicyclic unsaturated carboxylic acid ester in which a carboxylic acid ester group represented by the formula (I):wherein R<1 represents an alkyl having 1 to 4 carbon atoms, R represents an alicyclic hydrocarbon residue which may be optionally substituted with a group selected from hydroxyl and oxo, and R<2 represents an alkyl having 1 to 4 carbon atoms, or R and R<2, together with carbon atoms to which R<2 and R are bonded, form a ring, is bonded to an alicyclic hydrocarbon having a polymerizable carbon-carbon double bond in its ring; and a polymeric unit (b) derived from maleic anhydride; and an acid-generating agent (Y).
Inventors:
Yasunori Uetani
Kim Sung-sung
Kim Sung-sung
Application Number:
JP2000203648A
Publication Date:
August 25, 2010
Filing Date:
July 05, 2000
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
G03F7/039; C08F8/12; C08F222/06; C08F232/00; C08K5/00; C08K5/17; C08L45/00; G03F7/004; H01L21/027
Domestic Patent References:
| JP2001083708A | ||||
| JP2000235263A | ||||
| JP2000186118A | ||||
| JP2000309611A | ||||
| JP11327147A | ||||
| JP11218924A | ||||
| JP11160877A | ||||
| JP2000292917A |
Attorney, Agent or Firm:
Toru Nakayama